Продам ZBA-21 Electron Beam Exposure System Б/У в Bucuresti

Used and operational Electron Beam Exposure System for sale

Model: ZBA 21

Manufacturer: CARL ZEISS JENA

Prod. Nr: 112, ~1990 vintage.

The equipment for electron beam exposure used to produce coated glass with electronoresist and Cr layer masks. Photomasks fabrication and direct write electron beam lithography with minimal feature size around 200÷400 nm.

The masks are fabricated for several micro components with different applications:

- Microelectronics;

- Reticles, Grids, Resolution Target;

- Micro Lens, Fresnel Lens, Diffractive Optical Elements, Computer Generated Holograms.

Equipment details:

- Electron beam lithography system;

- Variable shaped system;

- Shot size 100×100 nm2 - 6.3×6.3 µm2;

- Maximal substrate size 7 inch square (photoplates), 6 inch wafers;

- 20 keV electron energy;

- Operational and maintenance manuals, spare parts included.  

Available for sale and additional equipments: spin coating, UV mask multiplier, alignment and UV exposure, microscopes.